INFLUENCE OF DEPOSITION RATE ON THE FORMATION AND INTERFACE STRUCTURE OF NiCo THIN FILMS ON Ni
Abstract
Molecular dynamics simulations were performed to investigate the effect of deposition rate on the growth of Ni₅₀Co₅₀ thin films on a Ni(001) substrate. Deposition rates from 5 to 25 atoms/ps were examined at 300 K with an incident energy of 2 eV. Higher deposition rates increased surface roughness, structural disorder, and interfacial atomic mixing, whereas lower rates promoted smoother films and sharper interfaces. These findings provide atomistic insights into thin-film growth and guidance for optimizing NiCo coating deposition.
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